一、課程說明(Course Description)
Chapter 1 Introduction
Chapter 2 Nuclear Energy Loss / Electronic Energy Loss
Chapter 3 Range Distributions / Energy Deposition Distributions
Chapter 4 Damage Distributions
Chapter 5 Computer Simulation of Ion Implantation
Chapter 6 Ion Implantation Machines
Chapter 7 Rutherford Backscattering Spectrometry
Chapter 8 Sputtering
Chapter 9 Secondary Ion Mass Spectrometry
Chapter 10 Ion Channeling Effects
Chapter 11 Raman Scattering Spectrometry
Chapter 12 Plasma Immersion Ion Implantation
二、指定用書(Text Books)
Handout can be reached at the following ftp address:
ftp： 140.114.121.48
帳號： jhliang2
密碼： jhliang2
port： 31
資料夾： ESS524
三、參考書籍(References)
1. H. Ryssel and I. Ruge, "Ion Implantation," (John Wiley & Sons Ltd., 1986).
2. M. Nastasi, J.W. Mayer, and J.K. Hirvonen, "Ion-solid interactions:
fundamentals and applications," Cambridge Solid State Science Series,
Cambridge University Press 1996.
3. J.F. Ziegler, J.P. Biersack, and U. Littmark, "Stopping and Range of Ions
in Solids," vol. 1, (Pergamon Press, New York, 1985).
4. M.A. Kumakhov and F.F. Komarov, "Energy Loss and Ion Ranges in Solids,"
(Gordon and Breach Science Publishers, New York, 1 1979).
5. D. Stievenard and J.C. Bourgoin, "Ion Implantation in Semiconductors,"
(Trans Tech Publications Ltd., Switzerland, 1988).
6. H. Gnaserm, "Low-Energy Ion Irradiation of Solid Surfaces," (Springer-
Verlag Ltd., Berlin, 1999).
四、教學方式(Teaching Method)
投影片教學
專題演講
修課學生上台專題報告
五、教學進度(Syllabus)
每週三小時
六、成績考核(Evaluation)
Homework 25%
Presentation 10%
Term Paper 20%
Examination 45%
七、可連結之網頁位址
ftp： 140.114.121.48
帳號： jhliang2
密碼： jhliang2
port： 31
資料夾： ESS524