一、課程說明(Course Description)
<br>This course firstly introduces vacuum technology and kinetics of surface 
<br>processes.  The major content includes the vapor deposition processes, PVD and
<br>CVD, and film formation and structure.  The methods of characterization of thin
<br>film will be briefly introduced.  To take this course, students are required to have some background on Materials Science (ESS2500 Introduction to Materials Science or ESS 3510 and 3520 Physical Metallurgy I,II) and on Thermodynamics of Materials (ESS2510 or equivalent). 
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<br> 二、指定用書(Text Books)
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<br>Materials Science of Thin Films, Milton Ohring, Second Edition, Academic Press, 2002. Chapters 2 -5, 6-7 and 9-10.
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<br> 三、參考書籍(References)
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<br>1.Thin-Film Deposition- Principles and Practice
<br>  Donald L. Smith, McGraw-Hill, Inc. 1995.
<br>2.Physical Vapor Deposition of Thin Films
<br>  John E. Mahan, John Wiley & Sons, Inc. 2000.
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<br> 四、教學方式(Teaching Method)
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<br>Lecture and Discussion
<br>Lecture Notes will be handed out in the beginning of the semester.
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<br> 五、教學進度(Syllabus)
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<br>1. Vacuum Science and Technology
<br>2. Kinetics of Surface Processes
<br>3. Physical Vapor Deposition
<br>4. Chemical Vapor Deposition
<br>5. Film Formation and Structure
<br>6. Characterization of Thin Films (Brief Introduction)
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<br> 六、成績考核(Evaluation)
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<br>There will be one midterm exam (35%) and one comprehensive final exam (45%).  
<br>Problem set will be given constantly (20%).
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<br> 七、可連結之網頁位址
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