課程說明:
The course provides the essential knowledge to understand the properties of Ultrafast Extreme Ultraviolet
Radiation (EUV). After a comprehensive review of different EUV pulse generation approaches, different
temporal and spatial characterization methods will be discussed in detail. The EUV mirror coating
technique, EUV imaging and a few main Light-matter interaction phenomena will also be introduced. Some
special application topics shall be selected for further discussion at the end of this class.

教科書:
(1) Soft X-Rays and Extreme Ultraviolet Radiation, Principles and Applications, David Attwood
(2) Lecture notes

參考資料:
1. "Elements of X-ray Diffraction" 3rd Ed. by B.D. Cullity and S.R. Stock
2. Ultrashort Laser Pulse Phenomena, Jean-Claude Diels and Wolfgang Rudolph
3. X-ray Multiple-wave Diffraction: Theory and Application, series in Solid-State Science, S.-L.Chang


教學進度:

Review of Atom and Molecule Physics 4 weeks
‧ Fundamental postulates of quantum mechanics
‧ Atomic Sturcture
‧ Energy Levels and Emission Processes
‧ Nuclear Motion
‧ Basic Absorption and Emission Process
‧ Laser and Atom interaction
‧ Radiation and Scattering at EUV and Soft X-ray wavelegnth

Wave Propagation at Soft X-rays and EUV Wavelength 4 weeks
‧ The Wave Equation and Refractive index
‧ Phase Varian and Absorption of Waves
‧ Optics Components for X-ray and EUV
‧ Design of Dielectric Mirrors for EUV

Ultrafast Soft X-rays and EUV light source 4 weeks
‧ Synchrotron Radiation
‧ Hot Dense Plasmas
‧ X-rays and EUV Lasers
‧ High Harmonic Generation

Special Topic: EUV pulse characterization and applications 4 weeks
‧ Femtosecond, Attosecond EUV pulse characterization
‧ Microscopy with diffraction optics
‧ Deep Ultraviolet and Extreme Ultraviolet Lithography

教學方式
Powerpoint presentations


成績考核
Homework 35%
Take home Mid-term 30%
Project paper and final presentation 35%