一、課程說明(Course Desc<x>ription) 
<br>The silicon integrated circuit is surely one of the wonders of our age. The ability to fabricate hundreds of 
<br>millions of individual components on a chip with an area of a few centimeter square has enabled the 
<br>information age. This course introduces the key aspects of nanolithography in theory, practice, and 
<br>innovations on diffraction-ba<x>sed imaging as well as materials, equipment, and processing in nanolithography 
<br>as well as the manufacturing practice associated with the technologies used in silicon chip fabrication. The 
<br>underlying scientific basis for those technologies will also be given in a fundamental level to inspire students’ 
<br>thinking. There are also opportunities to train students in creativity, logical thinking, and problem solving. 
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<br>二、教科書(Text books)
<br>1.	“Optical Lithography; Here is Why” Burn J. Lin, SPIE Press 2010 1st Ed. or 2021 2nd Ed. 
<br>2.	“Silicon VLSI Technology”, J. D. Plummer, M. M. Deal, and P. B. Griffin, Prentice Hall, 2000.
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<br>三、參考書籍(References) 
<br>1. “Principles of Optics” Born & Wolf, any edition 
<br>2. “Introduction to Microlithography” L.F. Thompson, C.G. Willson, and M.J. Bowden, ACS Professional 
<br>Reference Book, 1994 
<br>3. “Molecular theory of Lithography” Uzodinma Okoroanyanwu, SPIE Press 2015
<br>4. Michael Quirk and Julian Serda, Semiconductor Manufacturing Technology, Prentice 
<br>Hall, 2001. 
<br>5. Robert Doering and Yoshio Nishi, Handbook of Semiconductor Manufacturing Technology, 
<br>CRC Press 2008. 
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<br>四、教學方式(Teaching Method) 
<br>This course is intended to introduce students with knowledge in nanolithography and other semiconductor 
<br>processes including ion implantation, diffusion, etching, deposition, and metrologies. A broader ob<x>jective is 
<br>to use these processing techniques as vehicles to train students on innovative thinking and problem solving. 
<br>1. In Chinese/English
<br>2. Power point slides will be uploaded in the iLMS system one week before we start the chapter. 
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<br>五、教學進度(Syllabus) 
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<br>1. Imaging and resolution enhancement
<br>2. Alignment and overlay
<br>3. DUV, Immersion, and EUV Exposure systems
<br>4. Imaging Processing systems
<br>5. Semiconductor Manufacturing
<br>6. Diffusion
<br>7. Ion Implantation
<br>8. Thin Film Deposition
<br>9. Etching
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<br>六、成績考核(Evaluation) 
<br> 1. Midterms
<br> 2. Finals
<br> Percentage will be determined in class of the first day.  
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