一、課程說明(Course Desc<x>ription)
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<br>This course firstly introduces vacuum technology and kinetics of surface 
<br>processes.  The major content includes the vapor deposition processes, PVD and
<br>CVD, and film formation and structure.  The methods of characterization of thin
<br>film will be briefly introduced.  To take this course, students are required to 
<br>have some background on Materials Science (ESS2500 Introduction to Materials 
<br>Science or ESS 3510 and 3520 Physical me<x>tallurgy I,II) and on Thermodynamics of 
<br>Materials (ESS2510 or equivalent). 
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<br>二、指定用書(Text Books)
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<br>Materials Science of Thin Films, Milton Ohring, Second Edition, Academic Press, 
<br>2002. Chapters 2-5, 6-7 and 9-10. You can use the third edition of this book, 
<br>but not necessary.
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<br>三、參考書籍(References)
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<br>1.Thin-Film Deposition- Principles and Practice
<br>  Donald L. Smith, McGraw-Hill, Inc. 1995.
<br>2.Physical Vapor Deposition of Thin Films
<br>  John E. Mahan, John Wiley & Sons, Inc. 2000.
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<br>四、教學方式(Teaching Method)
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<br>Lecture and Discussion
<br>Lecture Notes will be handed out in the beginning of the semester. Homework 
<br>problems and announcement will be emailed into student personal email account. 
<br>Please check your email account constantly.Class reocrding will be available in 
<br>teaching Google drive.
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<br>五、教學進度(Syllabus)
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<br>1. Vacuum Science and Technology
<br>2. Adsorption/Desorption of Molecules on Surface
<br>3. Physical Vapor Deposition
<br>4. Chemical Vapor Deposition
<br>5. Film Formation and Structure
<br>6. Characterization of Thin Films (brief introduction)
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<br>六、成績考核(Evaluation)
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<br>There will be one midterm exams (35%) and one comprehensive final exam (45%).  
<br>Problem set will be given constantly (20%).
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