一、課程說明(Course Desc<x>ription) 
<br>
<br>Topics: 
<br>Gases, Gas Phase Collision Processes, Plasma, DC Glow Discharge, RF 
<br>Discharge, 
<br>Sputtering, Plasma Etching, Particle and Energy Balance in Discharges, 
<br>Inductively Coupled Plasma Source, Electron Cyclotron Resonance Plasma Souce, 
<br>
<br>
<br>
<br>二、指定用書(Text Books) 
<br>
<br>1. "Glow Discharge Processes, sputtering and plasma etching", B. Chapman, 
<br>John 
<br>Wiley & Sons, New York, 1980. 
<br>2. "Principles of Plasma Discharges and Materials Processing", M. A. Liberman 
<br>and A. J. Lichtenberg, John Wiley & Sons, New York, 1994. 
<br>
<br>
<br>三、參考書籍(References) 
<br>
<br>1. "Plasma Etching, an introduction", eds. D. M. Manos and D. L. Flamm, 
<br>Academic Press, New York, 1989. 
<br>2. "Dry Etching for VLSI", A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. 
<br>Brader, Plenum Press, 1991. 
<br>3. "Industrial Plasma Enginerering, Vol. 1 principles", J. R. Roth, Institute 
<br>of Physics Publishing, Bristol and Philadelphia, 1995. 
<br>4. "High Density Plasma Sources, design, physics and performance", ed. O. A. 
<br>Popov, Noyes Pub., New Jersey, 1995. 
<br>5. "Physics of Thin Films, vol. 18 plasma sources for thin film deposition 
<br>and 
<br>etching", eds. M. H. Francombe, J. L. Vossen, Academic Press, New York, 1994. 
<br>6. "Gas Discharge Physics", Y. P. Raizer, Springer-Verlag, Berlin, 1991. 
<br>7. "Microwave Excited Plasma", M. Moisan, J. Pelletier", Elsevier Science 
<br>Pub., 1992. 
<br>8. "Microwave Discharges, fundamentals and Applications", C. M. Ferreira, M. 
<br>Moisan, eds., Plenum Press, New York, 1992. 
<br>9. "Handbook of Plasma Processing Technology: Fundamentals, Etching, 
<br>Deposition and Surface Interactions", S. M. Rossnagel, J. J. Cuomo, W. D. 
<br>Westwood, Noyes Publications, Park Ridge, New Jersey, 1990. 
<br>10. "Plasma Technology", M. Capitelli, C. Gorse, Eds., Plenum Press, New 
<br>York, 
<br>1992. 
<br>
<br>四、教學方式(Teaching Method) 
<br>
<br>Two exams and some homeworks. 
<br>Three hours per week. 
<br>
<br>
<br>五、教學進度(Syllabus) 
<br>
<br>About two weeks for each topic. 
<br>
<br>1. Gases 
<br>2. Gas Phase Collision Processes 
<br>3. Plasma 
<br>4. DC Glow Discharge 
<br>5. RF Discharge 
<br>6. Sputtering 
<br>7. Plasma Etching 
<br>8. Particle and Energy Balance in Discharges 
<br>9. Inductively Coupled Plasma Source 
<br>10. Electron Cyclotron Resonance Plasma Source 
<br>
<br>
<br>六、成績考核(Evaluation) 
<br>
<br>Project study: 100 % (A or B)
<br>A. Plasma Simulation Analysis 
<br>   - Code: CFD-ACE+ 
<br>   - ICP/2D/steady state 
<br>B. Paper Review
<br>
<br>七、可連結之網頁位址 
<br>