課程說明(Course Description)
In this course, it covers the capabilities and challenges in optical lithography
using practical approaches to understand basic scientific and engineering
principles. Using fundamental concepts, practical examples, and optical
demonstrations, the limits of optical lithography are defined and explored. As
optical lithography is pushed beyond classical limits, an understanding of imaging
from a dimensional description (of the mask and wafer) as well as a spatial
frequency perspective (of the optics) becomes necessary.. The goal is to develop a
fundamental and intuitive understanding of topics related to diffraction by a
photomask, collection by an optical system, and imaging into a photoresist.
Fourier spectral analysis, coherency theory, lens interaction, aberration
concepts, and image enhancement are describe in fairly simple terms and several
optical demonstrations help develop the concepts.

教科書與參考書籍（Text books and references)
1. Optical Lithography; Here is Why” Burn J. Lin, SPIE Press 2010
2. Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki
Suzuki, Bruce Smith


週次 課程進度、內容、主題
1　 Syllabus introduction and introduction, semiconductor industry overview
2　 Introduction to optical lithography
3　 Electromagnetic radiation, Plane waves, Intensity
4　 Diffraction, Fourier transforms; Aerial image formation
5　 Partial coherence; Aberrations
6　 Flare and defocus
7　 Vector imaging, image metrics; Standing waves
8　 Swing curves; Top and bottom ARCs
9　 Midterm　
10　 Chemistry of photoresisit Materials.
11　 RET – Optical proximity correction
12　 Focus exposure, process window, DOF, MEEF
13　 EUV lithography I
14　 EUV lithography II
15　 Metrology system
16　 Advanced lithography I: X-ray lithography, LIGA, interference lithography.
17　 Advanced lithography II: E-beam lithography
18　 Final